Pioneer and Leader
in Nanoimprint
Tools & Solutions

Inventor of NIL technology.

founded by Princeton Professor Stephen Y. Chou

in 1997

Machine lineup for up to

12-inch uniform imprint with patented Air Cushion Press™ (ACP) technology

More than 100 tools installed in 15 countries, 4 continents, provider of 80% nanoimprint machines in North America

Industry Leading contract research and nanoimprint services

Why Nanonex

Nanonex NIL solution offers low-cost, high-throughput, large-area patterning of 3D nanostructures with sub-10 nm resolution and accurate overlay alignment. It also includes all forms of nanoimprinting, such as thermoplastic, UV-curable, thermal-curable, and direct imprinting (embossing). The Nanonex NIL solution can meet the needs of a broad spectrum of markets, such as optical devices, consumer electronics, biomedical, displays, lighting, data storage, semiconductor ICs, and advanced materials.

Best nanoimprint solution technology
Versatile tools for all forms of imprinting
UV or thermal imprint or both (operating simultaneously) within a single machine
Air Cushion Press™ (ACP) for wafer-scale uniformity
Advanced High-Fidelity Flexible Mold (HiF2M)
Smart Sample Holders (SSH) for substrates and masks with arbitrary shapes and sizes
Fully automated nanoimprint operation
Fast Radiative Heating (FRH) for ultra-fast thermal NIL
A broad range of tools to choose from
A variety of NIL materials and processes
IP protections